Paper Title:
The Influence of Total and Oxygen Partial Pressures on Structure and Hydrophilic Property of TiO2 Thin Films Deposited by Reactive DC Magnetron Sputtering
  Abstract

TiO2 thin films have been deposited by reactive DC magnetron sputtering technique to study the effect of total pressure and oxygen partial pressure on structure and hydrophilic properties. The crystal structure and hydrophilic property was measured by XRD and contact angle meter, respectively. The results showed that the films were composed of pure rutile and mixed of anatase/rutile structure dependent on the total pressure and oxygen partial pressure. It was found that all films can perform hydrophilic property. In case of high total pressure, the films showed superhydrophilic property, whereas the films deposited under various oxygen partial pressures with fixed total pressure were all films exhibit superhydrophilic property.

  Info
Periodical
Advanced Materials Research (Volumes 55-57)
Main Theme
Edited by
Tawee Tunkasiri
Pages
465-468
DOI
10.4028/www.scientific.net/AMR.55-57.465
Citation
S. Chaiyakun, A. Buranawong, T. Deelert, N. Witit-Anun, "The Influence of Total and Oxygen Partial Pressures on Structure and Hydrophilic Property of TiO2 Thin Films Deposited by Reactive DC Magnetron Sputtering", Advanced Materials Research, Vols. 55-57, pp. 465-468, 2008
Online since
August 2008
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Price
$32.00
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