Paper Title:

The Influence of Total and Oxygen Partial Pressures on Structure and Hydrophilic Property of TiO2 Thin Films Deposited by Reactive DC Magnetron Sputtering

Periodical Advanced Materials Research (Volumes 55 - 57)
Main Theme Smart Materials
Edited by Tawee Tunkasiri
Pages 465-468
DOI 10.4028/www.scientific.net/AMR.55-57.465
Citation Surasing Chaiyakun et al., 2008, Advanced Materials Research, 55-57, 465
Online since August, 2008
Authors Surasing Chaiyakun, A. Buranawong, T. Deelert, N. Witit-anun
Keywords DC Sputtering, Hydrophilic, Reactive Magnetron Sputtering, TiO2
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Abstract

TiO2 thin films have been deposited by reactive DC magnetron sputtering technique to study the effect of total pressure and oxygen partial pressure on structure and hydrophilic properties. The crystal structure and hydrophilic property was measured by XRD and contact angle meter, respectively. The results showed that the films were composed of pure rutile and mixed of anatase/rutile structure dependent on the total pressure and oxygen partial pressure. It was found that all films can perform hydrophilic property. In case of high total pressure, the films showed superhydrophilic property, whereas the films deposited under various oxygen partial pressures with fixed total pressure were all films exhibit superhydrophilic property.