The use of ceramic composite materials in aerospace applications requires the development of oxidization protection coatings which can withstand very high temperatures. HfO2 is a promising material as a high temperature oxidization protective layer. HfO2 coatings have been deposited by radiation frequency magnetron sputtering all over the surface of SiC substrates and were tested under re-entry conditions. Also their oxidization resistance in air in the temperature range 1100 to 1450°C has been examined. The coatings were found to be stable and well-adhering to the substrate even after 100 re-entry cycles. No oxidization of the underlying SiC structure is observed. Re-entry and oxidization tests result in the formation of HfSiO4 at the HfO2/SiC interface, which further promotes their oxidization resistance.