Paper Title:
Metrology Method of Line Edge Roughness with Nanometer Scale Precision Using Atomic Force Microscopes
  Abstract

This paper proposes a methodology method for line edge roughness (LER) measurement and characterization using atomic force microscope. The definition and origins of LER are discussed firstly. A LER quantificational method using image processing and threshold method is presented, which is used to analyze AFM images of Silicon lines and extract LER characteristics. Then the energy distribution of LER is determined by the multi-scale analysis based on wavelet transform and the parameters of multi-scale characterization were given. The experiment data shows that this method can offer an effective quantitative analysis of LER.

  Info
Periodical
Advanced Materials Research (Volumes 60-61)
Edited by
Xiaohao Wang
Pages
22-26
DOI
10.4028/www.scientific.net/AMR.60-61.22
Citation
N. Li, X. Z. Zhao, W. J. Wang, "Metrology Method of Line Edge Roughness with Nanometer Scale Precision Using Atomic Force Microscopes", Advanced Materials Research, Vols. 60-61, pp. 22-26, 2009
Online since
January 2009
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Xiao Li Zhao, Shen Dong, Ying Chun Liang, T. Sun, Yong Da Yan
Abstract:Atom Force Microscopy (AFM) can be employed to create surfaces in Si substrate with recessed features. The resulting patterns can serve as...
762
Authors: Yu Guo Cui, Bing Feng Ju, J. Aoki, Yoshikazu Arai, Wei Gao
Abstract:In this paper, we applied the contact constant-height mode together with the pre-compensation technique which can realize the capability of...
35
Authors: Zheng Min Li, Zhi Wei Chen, Min Tan, Ke Jing Xu, Bing Jiang
Abstract:Nano-TiO2 coating film is one of the efficient photocatalysts. The particle size distribution of TiO2 has important influence on...
22
Authors: Tae Gon Kim, Quoc Toan Le, Samuel Suhard, Marcel Lux, Guy Vereecke, Martine Claes, Herbert Struyf, Stefan De Gendt, Paul W. Mertens, Marc M. Heyns
Chapter 7: Back-End-of-Line Cleaning
Abstract:Atomic force microscope (AFM) with inclined sample measurement and hydrophobic functionalized AFM probe was used to visualize the sidewall of...
197
Authors: Lan Zhang, Atsushi Hosoi, Yang Ju
Abstract:Using the microwave atomic force microscope (M-AFM) measuring system, the sample of Au nanowires arranged on glass wafer was sensed with...
200