Paper Title:
Fabrication of Nanomechanical Resonators in Silicon Nitride
  Abstract

We report our efforts towards fabricating nanomechanical resonators patterned by optical lithography in silicon nitride. Optical lithography has advantages of low cost and high efficiency over electron-beam lithography. Double clamped beam resonators with thickness 150nm, length and lateral dimensions 20um, 800nm have been designed. Through utilizing reactive ion etching and controlling gas flow, reaction time of CF4 and O2 plasma and power of the upper and lower electrode, nanomechanical resonators with lateral dimensions within 200nm are demonstrated.

  Info
Periodical
Advanced Materials Research (Volumes 60-61)
Edited by
Xiaohao Wang
Pages
228-231
DOI
10.4028/www.scientific.net/AMR.60-61.228
Citation
M. Liu, J. Zhu, S. X. Jia, M. Zhuo, L. Lu, Q. C. Gong, "Fabrication of Nanomechanical Resonators in Silicon Nitride", Advanced Materials Research, Vols. 60-61, pp. 228-231, 2009
Online since
January 2009
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$32.00
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