Paper Title:
The Slurry for Glass Polishing by Micro Abrasive Suspension Jets
  Abstract

The influence of different dispersants and suspending agents of CeO2 polishing powder was investigated, including sodium hexametaphosphate, polyethyleneglycoll, polyacrylic acid, anionic polyacrylamide, and their mixtures. The suspension stability of ceria particles in slurries and the pH dependence were examined by the measurement of zeta potential, sedimentation and viscosity, etc. The material removal rate and surface roughness of different slurries for K9 glass polishing were studied. The slurry mixed by three kinds of dispersants can achieved the maximum material removal rate and the minimum surface roughness.

  Info
Periodical
Advanced Materials Research (Volumes 69-70)
Edited by
Julong Yuan, Shiming Ji, Donghui Wen and Ming Chen
Pages
322-327
DOI
10.4028/www.scientific.net/AMR.69-70.322
Citation
Y. P. Liao, C. Y. Wang, Y. N. Hu, Y. X. Song, "The Slurry for Glass Polishing by Micro Abrasive Suspension Jets", Advanced Materials Research, Vols. 69-70, pp. 322-327, 2009
Online since
May 2009
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Price
$32.00
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