Paper Title:
An Effect Contrast for Chemical Mechanical Polishing with Mechanical Polishing for Tungsten Steel
  Abstract

The interaction between the tungsten steel surface and the polishing fluid & abrasive were discussed by AFM, SEM and XRD test in order to compare the chemical performances and mechanical action of the tungsten steel polishing in the paper. The chemical mechanical polishing (CMP) and the mechanical polishing (MP) was employed, respectively. The experiments results indicated that the CMP with a higher the materials removal ratio than by MP. Because a chemical corrosion effect implies that slurries with the highest removal rate have high dissolution rate, and have a lower the residual stress, however the surface took on wrinkling.

  Info
Periodical
Advanced Materials Research (Volumes 69-70)
Edited by
Julong Yuan, Shiming Ji, Donghui Wen and Ming Chen
Pages
98-102
DOI
10.4028/www.scientific.net/AMR.69-70.98
Citation
K. H. Zhang, D. H. Wen, "An Effect Contrast for Chemical Mechanical Polishing with Mechanical Polishing for Tungsten Steel", Advanced Materials Research, Vols. 69-70, pp. 98-102, 2009
Online since
May 2009
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Price
$32.00
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