Paper Title:
Effects of Film Thickness on Laser Induced Voltage (LIV) of La2/3Ca1/3MnO3:Ag0.05 Thin Films Grown on LaAlO3 Substrates
  Abstract

La2/3Ca1/3MnO3:Ag0.05(LCMO:Ag0.05) thin films were prepared on vicinal cut LaAlO3(LAO) substrates with various film thicknesses by pulsed laser deposition technique (PLD). XRD results show that all the samples are shown along the (00l) orientation in orthorhombic structure with Pbnm space group. While the film thickness is around 450nm, the optimum LIV effects of the epilayer thin film have been obtained. The LIV effects enhancement of the LCMO:Ag0.05 thin films due to the photon scattering effects have been restrained and anisotropic seebeck coefficient improved.

  Info
Periodical
Chapter
Chapter 1: Novel and Advanced Materials, Materials Science and Technologies
Edited by
Qingzhou Xu
Pages
54-58
DOI
10.4028/www.scientific.net/AMR.721.54
Citation
X. Liu, Y. Z. Yan, Q. M. Chen, H. Zhang, M.G. Cao, Y.A. Yang, P.X. Zhang, "Effects of Film Thickness on Laser Induced Voltage (LIV) of La2/3Ca1/3MnO3:Ag0.05 Thin Films Grown on LaAlO3 Substrates", Advanced Materials Research, Vol. 721, pp. 54-58, 2013
Online since
July 2013
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$32.00
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