Study of Three-Dimensional Polishing Using Magnetic Compound Fluid (MCF)
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| Journal |
Advanced Materials Research (Volumes 76 - 78) |
| Volume |
Advances in Abrasive Technology XII |
| Edited by |
Han Huang, Liangchi Zhang, Jun Wang, Zhengyi Jiang, Libo Zhou, Xipeng Xu and Tsunemoto Kuriyagawa |
| Pages |
288-293 |
| DOI |
10.4028/www.scientific.net/AMR.76-78.288 |
| Online since |
June, 2009 |
| Authors |
Takashi Sato, Yong Bo Wu, Wei Min Lin, Kunio Shimada |
| Keywords |
Magnetic Compound Fluid (MCF), Magnetic Field Assisted Finishing, Magnetic Fluid MF, Magnetorheological Finishing (MRF), Polishing, Three-Dimensional Surface |
| Abstract |
Magnetic compound fluid (MCF), a functional fluid responding to magnetic field, is expected for an application to many engineering fields. In this paper, the effect of magnetic fields on the polishing force and the restoring ability of the MCF are studied followed by the proposal of a new polishing technique using the MCF. Under a fluctuating magnetic field generated by a revolution of permanent magnet, the magnetic particles in the MCF show a higher particle disposition and an accumulating action compared to a static magnetic field. Thus the MCF generates the greater restoring ability but the lower polishing force compared to that under the static magnetic field. When the MCF under the fluctuating magnetic field is applied to the polishing as the flexible tool, it shows the high polishing performance. As a result, a feasibility of a new polishing technique using the MCF for a three-dimensional structure is confirmed. |
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