This study targets the development of a polishing technique that uses a photocatalyst and a fluorescent substance excited by an ultraviolet ray. Nickel (hereafter referred to as Ni) was polished chemically and mechanically at the micrometer level under ultraviolet-ray irradiation. Measurements clarified that TiO2 of 0.1-μm grain size, at which size the excitation by the ultraviolet ray was less influential, mechanically polished the Ni. Cathilon (a luminous dye) chemically polishes Ni. The corrosion of the Ni surface became large under ultraviolet-ray excitation. A flat surface was attained on the Ni by chemical and mechanical polishing using both the TiO2 and cathilon, when was irradiated by an ultraviolet ray.