Polishing of Nickel Cylinder Using a Photocatalyst and Fluorescent Substance Excited by an Ultraviolet Ray |
| Journal |
Advanced Materials Research (Volumes 76 - 78) |
| Volume |
Advances in Abrasive Technology XII |
| Edited by |
Han Huang, Liangchi Zhang, Jun Wang, Zhengyi Jiang, Libo Zhou, Xipeng Xu and Tsunemoto Kuriyagawa |
| Pages |
337-342 |
| DOI |
10.4028/www.scientific.net/AMR.76-78.337 |
| Online since |
June, 2009 |
| Authors |
Takeshi Tanaka |
| Keywords |
Electron, Fluorescent Substance, Hole, Metal Surface Treatment, Nickel, Photocatalyst, Polishing, Quantum Chemistry, Ultraviolet-Ray Exciting |
| Abstract |
This study targets the development of a polishing technique that uses a photocatalyst and a fluorescent substance excited by an ultraviolet ray. Nickel (hereafter referred to as Ni) was polished chemically and mechanically at the micrometer level under ultraviolet-ray irradiation. Measurements clarified that TiO2 of 0.1-μm grain size, at which size the excitation by the ultraviolet ray was less influential, mechanically polished the Ni. Cathilon (a luminous dye) chemically polishes Ni. The corrosion of the Ni surface became large under ultraviolet-ray excitation. A flat surface was attained on the Ni by chemical and mechanical polishing using both the TiO2 and cathilon, when was irradiated by an ultraviolet ray. |
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