Preparation and Properties of TiN Thin Films by D.C. Reactive Magnetron Sputtering |
|
| Journal | Advanced Materials Research (Volumes 79 - 82) |
|---|---|
| Volume | Multi-Functional Materials and Structures II |
| Edited by | Yansheng Yin and Xin Wang |
| Pages | 2275-2278 |
| DOI | 10.4028/www.scientific.net/AMR.79-82.2275 |
| Citation | Yu Qiao Shan et al., 2009, Advanced Materials Research, 79-82, 2275 |
| Online since | August, 2009 |
| Authors | Yu Qiao Shan, Xun Lei Gu, You Xin Wang |
| Keywords | Magnetron Sputtering, Micro Hardness, Roughness Rate, Transmittance |
| Abstract | TiN thin films were deposited by D.C reactive magnetron sputtering on glass and metal substrate. The relations between the technical conditions and the properties of the thin films are studied, According to control the intensity of gas pressure by changing the flux of Ar and N2, the structure of TiN films could be control. By changing the target power、N2 flux and substrate temperature, the relations between the technical conditions and the structure of TiN thin films were analyzed so as to produce the TiN thin films of excellent decorations, good corrosion resistance and high micro-hardness. |
| Full Paper | 
Get the full paper by clicking here
|
First page example
