Paper Title:
Preparation and Properties of TiN Thin Films by D.C. Reactive Magnetron Sputtering
  Abstract

TiN thin films were deposited by D.C reactive magnetron sputtering on glass and metal substrate. The relations between the technical conditions and the properties of the thin films are studied, According to control the intensity of gas pressure by changing the flux of Ar and N2, the structure of TiN films could be control. By changing the target power、N2 flux and substrate temperature, the relations between the technical conditions and the structure of TiN thin films were analyzed so as to produce the TiN thin films of excellent decorations, good corrosion resistance and high micro-hardness.

  Info
Periodical
Advanced Materials Research (Volumes 79-82)
Edited by
Yansheng Yin and Xin Wang
Pages
2275-2278
DOI
10.4028/www.scientific.net/AMR.79-82.2275
Citation
Y. Q. Shan, X. L. Gu, Y. X. Wang, "Preparation and Properties of TiN Thin Films by D.C. Reactive Magnetron Sputtering", Advanced Materials Research, Vols. 79-82, pp. 2275-2278, 2009
Online since
August 2009
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$32.00
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