Paper Title:
Decomposition of Toluene at Optimal TiO2 Thin Film Photocatalytic Process Using the Taguchi Method
  Abstract

In this study, the Taguchi method was used to optimize the preparation of titanium dioxide thin film reactor through modified chemical vapor deposition (CVD) method and then conversion ratio of toluene was evaluated at the optimal condition. The results indicated that optimal condition for preparation of TiO2 thin film reactor was as followings: water bath temperature of 80°C, Ti (OC3H7)4 / H2O ratio of 4, carrier gas flow rate of 1000 mL min-1, catalytic oxidation temperature of 400°C, oxidation time of 8 hrs, calcination temperature of 450°C, spraying speed of 30 rpm and furnace linear motion geared motor speed of 75 cm min-1. The conversion ratio of 56.56 ppmv toluene could be achieved up to 99.8% with the irradiation intensity of 3.76μW cm-2 at the flow rate of 300 mL min-1 after 120 minutes.

  Info
Periodical
Advanced Materials Research (Volumes 79-82)
Edited by
Yansheng Yin and Xin Wang
Pages
647-650
DOI
10.4028/www.scientific.net/AMR.79-82.647
Citation
C. H. Lin, Y. J. Chang, M. Y. Hwa, Y. H. Hsieh, S. H. Yeh, C. Y. Chang, "Decomposition of Toluene at Optimal TiO2 Thin Film Photocatalytic Process Using the Taguchi Method", Advanced Materials Research, Vols. 79-82, pp. 647-650, 2009
Online since
August 2009
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$32.00
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