Paper Title:
Crystal Orientation and Hardness of Au/NiCr/Ta Films on Si-(111) Substrate Prepared by Magnetron Sputtering
  Abstract

Au/NiCr/Ta soft multi-layered metal films were deposited on hard Si-(111) substrate by magnetron sputtering. The crystal orientation, Hardness (H) and Elastic modulus (E) were investigated as a function of substrate temperature by XRD and nanoindentation techniques. The XRD revealed that all films on Si-(111) substrate are Au-(111) preferred orientation, indicating there are no alloying phases in the films, which is different from Au/NiCr/Ta films on Al2O3 substrate with a mixture of Au-(111) and Au-(200) orientation. Nanoindentation tests at shallow indentation depths (h≤t/4) where the hardness is reliable for metal films on hard substrate. Au film at substrate temperature 200°C has the highest hardness 4.2GPa. Meanwhile, the H/E value also indicated that the Au/NiCr/Ta films have preferable wear resistance at substrate temperature 200°C.

  Info
Periodical
Advanced Materials Research (Volumes 79-82)
Edited by
Yansheng Yin and Xin Wang
Pages
719-722
DOI
10.4028/www.scientific.net/AMR.79-82.719
Citation
W. Tang, X. S. Yin, L. J. Deng, J. Lu, "Crystal Orientation and Hardness of Au/NiCr/Ta Films on Si-(111) Substrate Prepared by Magnetron Sputtering", Advanced Materials Research, Vols. 79-82, pp. 719-722, 2009
Online since
August 2009
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