Paper Title:
Deposition of Fluorocarbon Thin Films on Polypropylene Substrate by RF Magnetron Sputtering
  Abstract

Radio frequency (rf) magnetron sputtering of polytetrafluoroethylene (PTFE) using argon as the working gas was used to prepare hydrophobic fluorocarbon films on a polypropylene substrate. The morphology, structure and hydrophobicity of the fluorocarbon films were analyzed by means of SEM, AFM, XPS and contact angle determination. The growth pattern in this system was a typical one-dimensional (1-D) Volmer-Weber growth mode. The films demonstrated dependence of structure and hydrophobicity on the conditions of preparation. The contact angle decreased with increasing discharge power and increased with increasing pressure. Those trends are attributed to the presence of differing proportions of -CF3, -CF2-, -CF-, and -C- in fluorocarbon thin films prepared with different energy.

  Info
Periodical
Advanced Materials Research (Volumes 79-82)
Edited by
Yansheng Yin and Xin Wang
Pages
875-878
DOI
10.4028/www.scientific.net/AMR.79-82.875
Citation
Y. H. Zhang, Q. Ji, W. F. Chen, "Deposition of Fluorocarbon Thin Films on Polypropylene Substrate by RF Magnetron Sputtering", Advanced Materials Research, Vols. 79-82, pp. 875-878, 2009
Online since
August 2009
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Price
$32.00
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