Paper Title:
MOCVD Route to the Fabrication of Calcium Copper Titanate (CaCu3Ti4O12) Thin Films
  Abstract

CaCu3Ti4O12 (CCTO) thin films have been successfully deposited by Metal Organic Chemical Vapor Deposition (MOCVD) technique. A novel approach based on a molten multicomponent precursor source has been applied. The molten mixture consists of the Ca(hfa)2•tetraglyme, Ti(tmhd)2(O-iPr)2, and Cu(tmhd)2 [Hhfa= 1,1,1,5,5,5-hexafluoro-2,4- pentanedione; tetraglyme= 2,5,8,11,14-pentaoxapentadecane; Htmhd= 2,2,6,6-tetramethyl-3,5- heptandione; O-iPr= iso-propoxide] precursors. Film complete structural and morphological characterizations have been carried out using several techniques [X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM)].

  Info
Periodical
Edited by
P. VINCENZINI
Pages
1194-1199
DOI
10.4028/www.scientific.net/AST.45.1194
Citation
R. Lo Nigro, R. G. Toro, G. Malandrino, I. L. Fragalà, "MOCVD Route to the Fabrication of Calcium Copper Titanate (CaCu3Ti4O12) Thin Films ", Advances in Science and Technology, Vol. 45, pp. 1194-1199, 2006
Online since
October 2006
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