MOCVD Route to the Fabrication of Calcium Copper Titanate (CaCu3Ti4O12) Thin Films |
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| Journal | Advances in Science and Technology (Volume 45) |
|---|---|
| Volume | 11th International Ceramics Congress |
| Edited by | P. VINCENZINI |
| Pages | 1194-1199 |
| DOI | 10.4028/www.scientific.net/AST.45.1194 |
| Citation | Raffaella Lo Nigro et al., 2006, Advances in Science and Technology, 45, 1194 |
| Online since | October, 2006 |
| Authors | Raffaella Lo Nigro, Roberta G. Toro, Graziella Malandrino, Ignazio L. Fragalà |
| Keywords | Calcium Copper Titanate, MOCVD Process, Thin Film |
| Abstract | CaCu3Ti4O12 (CCTO) thin films have been successfully deposited by Metal Organic Chemical Vapor Deposition (MOCVD) technique. A novel approach based on a molten multicomponent precursor source has been applied. The molten mixture consists of the Ca(hfa)2•tetraglyme, Ti(tmhd)2(O-iPr)2, and Cu(tmhd)2 [Hhfa= 1,1,1,5,5,5-hexafluoro-2,4- pentanedione; tetraglyme= 2,5,8,11,14-pentaoxapentadecane; Htmhd= 2,2,6,6-tetramethyl-3,5- heptandione; O-iPr= iso-propoxide] precursors. Film complete structural and morphological characterizations have been carried out using several techniques [X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM)]. |
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