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MOCVD Route to the Fabrication of Calcium Copper Titanate (CaCu3Ti4O12) Thin Films

Journal Advances in Science and Technology (Volume 45)
Volume 11th International Ceramics Congress
Edited by P. VINCENZINI
Pages 1194-1199
DOI 10.4028/www.scientific.net/AST.45.1194
Online since October, 2006
Authors Raffaella Lo Nigro, Roberta G. Toro, Graziella Malandrino, Ignazio L. Fragalà
Keywords Calcium Copper Titanate, MOCVD Process, Thin Film
Abstract CaCu3Ti4O12 (CCTO) thin films have been successfully deposited by Metal Organic Chemical Vapor Deposition (MOCVD) technique. A novel approach based on a molten multicomponent precursor source has been applied. The molten mixture consists of the Ca(hfa)2•tetraglyme, Ti(tmhd)2(O-iPr)2, and Cu(tmhd)2 [Hhfa= 1,1,1,5,5,5-hexafluoro-2,4- pentanedione; tetraglyme= 2,5,8,11,14-pentaoxapentadecane; Htmhd= 2,2,6,6-tetramethyl-3,5- heptandione; O-iPr= iso-propoxide] precursors. Film complete structural and morphological characterizations have been carried out using several techniques [X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM)].
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