Electron Transport and Dielectric Breakdown Kinetics in Pr2O3 High K Films |
| Journal |
Advances in Science and Technology (Volume 46) |
| Volume |
Mass and Charge Transport in Inorganic Materials III |
| Edited by |
P. VINCENZINI and V. BUSCAGLIA |
| Pages |
21-26 |
| DOI |
10.4028/www.scientific.net/AST.46.21 |
| Online since |
October, 2006 |
| Authors |
Patrick Fiorenza,
Raffaella Lo Nigro,
Vito Raineri,
Salvatore Lombardo,
Roberta G. Toro,
Graziella Malandrino,
Ignazio L. Fragalà
|
| Keywords |
Electrical Characterisation, MOCVD, Praseodymium, Thin Film |
| Abstract |
Praseodymium based dielectric thin films have been deposited by Metal-Organic
Chemical Vapour Deposition (MOCVD). Special emphasis has been placed upon deposition
parameters crucial to obtain Pr2O3 phase and upon interfacial characterization. In addition, dielectric
properties have been correlated to structural and compositional characteristics of praseodymium
containing films.
The breakdown (BD) characteristics of Pr2O3 films have been investigated by an innovative and
handling approach based on C-AFM. Moreover, the BD kinetics have been elucidated considering
the role of defects in the conduction mechanisms. |
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