Growth of Phosphorous Doped n-Type Diamond and the Electrical Properties |
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| Journal | Advances in Science and Technology (Volume 48) |
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| Volume | Diamond and Other New Carbon Materials IV |
| Edited by | P. VINCENZINI and E. CAPPELLI |
| Pages | 1-8 |
| DOI | 10.4028/www.scientific.net/AST.48.1 |
| Citation | Satoshi Koizumi, 2006, Advances in Science and Technology, 48, 1 |
| Online since | October, 2006 |
| Authors | Satoshi Koizumi |
| Keywords | Chemical Vapour Deposition (CVD), Diamond, Hall-Effect, Semiconductor |
| Abstract | We have succeeded to grow high quality phosphorus doped n-type diamond thin films on {111} diamond substrates. Although the ionization energy of phosphorus donor is large (0.57 eV), the n-type conductivity is clearly observed by Hall measurements. The Hall mobility is as high as 660 cm2/V-sec at room temperature. In this paper, current status of n-type diamond research are mentioned mainly focused on the growth of high mobility n-type diamond and its electrical properties. High quality diamond growth has been carried out by surface pre-treatment of diamond substrate. The Hall measurements performed in a wide temperature range gives detailed information about the n-type conductivity nature. |
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