Paper Title:
Carbon Nanowalls Formation by Radical Controlled Plasma Process
  Abstract

Carbon nanowalls (CNWs), i.e., two-dimensional carbon nanostructures, were fabricated using fluorocarbon capacitively coupled plasma-enhanced chemical vapor deposition assisted by H radical injection. The correlation between CNW growth and the fabrication conditions was investigated. The morphologies of CNWs were dependent on the types of carbon source gases and the amount of H radicals injected. In addition, H and CFx (x=1-3) radical densities in the plasma were measured using vacuum ultraviolet absorption spectroscopy and appearance mass spectrometry, respectively, to clarify the growth mechanism of CNWs. The density ratio of H radicals to CFx radicals was found to be an important factor responsible for the formation of CNWs from fluorocarbon/hydrogen systems and increased drastically as a result of H radical injection.

  Info
Periodical
Edited by
P. VINCENZINI and E. CAPPELLI
Pages
119-126
DOI
10.4028/www.scientific.net/AST.48.119
Citation
M. Hori, M. Hiramatsu, "Carbon Nanowalls Formation by Radical Controlled Plasma Process", Advances in Science and Technology, Vol. 48, pp. 119-126, 2006
Online since
October 2006
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