Paper Title:
Ti–Si–C Films Formed by Dual Beam Ion Assisted Deposition
  Abstract

Ti–Si–C coatings were formed at room temperature on AISI 316L steel substrates by dual beam ion assisted deposition technique from single compound Ti3SiC2 target. Scanning and transmission electron microcopy method were used to examine as-deposited coatings. Their morphology was smooth and dense and their thickness were in the range from 100 nm to 1μm. Raman spectra of coated substrates were collected up with five peaks at the same positions as for Ti3SiC2 compound target. TEM and HRTEM examinations, accompanied by SAED analyses revealed that deposited films were amorphous. Nanoindentation tests were provided on coated and uncoated substrates and hardness HIT and reduced elastic modulus EIT were calculated using the Oliver & Pharr method.

  Info
Periodical
Edited by
Pietro VINCENZINI and Ghislain MONTAVON
Pages
11-16
DOI
10.4028/www.scientific.net/AST.66.11
Citation
A. Twardowska, B. Rajchel, L. Jaworska, "Ti–Si–C Films Formed by Dual Beam Ion Assisted Deposition", Advances in Science and Technology, Vol. 66, pp. 11-16, 2010
Online since
October 2010
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