Mechanical, barrier and surface properties of aluminium oxide films were investigated by nanoindentation, microscratch and micro tensile tests, by isothermal oxidation and voltammetry, and by contact angle measurement. The films were grown on TA6V substrates by a low pressure MOCVD process from aluminium tri-isopropoxide. Modelling of local gas flow, gas concentration and deposition rate profiles was performed using the CFD code Fluent on the basis of an apparent kinetic law. Films grown at 350 °C are amorphous AlO(OH), the one at 480 °C is amorphous Al2O3 and the one at 700 °C is nanocrystalline -Al2O3. Scratch tests and micro tensile tests resulted in adhesive failure on the two films grown at low temperature whereas cohesive failure was observed for the high temperature growth. Sample processed at 350 °C presents significantly lower oxidation kinetics in dry air than the bare substrate. Contact angle changes approximately from 100 to 50 degrees for films processed at 350-480 °C and 700 °C, respectively. Concerning the electrochemical behavior in NaCl environment, polarization curves revealed that amorphous alumina coatings improved the corrosion resistance by comparison with the others oxide films. These consolidated results reveal promising combination of properties for the films grown at different temperatures with regard to the targeted applications.