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Internal Stress Evolution in Multicomponent Thin Metal Films under Electric Current

Journal Defect and Diffusion Forum (Volumes 129 - 130)
Volume Diffusion and Stresses
Edited by D.L. Beke and I.A. Szabó
Pages 215-224
DOI 10.4028/www.scientific.net/DDF.129-130.215
Citation Leonid M. Klinger et al., 1996, Defect and Diffusion Forum, 129-130, 215
Authors Leonid M. Klinger, A. Katsman, L. Levin
Keywords Diffusion, Electromigration, Internal Stress, Multicomponent Thin Films
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