Electromigration in Metal Interconnects: Electrical- and Stress Field Induced Diffusion in Small Dimensions |
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| Journal | Defect and Diffusion Forum (Volumes 129 - 130) |
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| Volume | Diffusion and Stresses |
| Edited by | D.L. Beke and I.A. Szabó |
| Pages | 225-228 |
| DOI | 10.4028/www.scientific.net/DDF.129-130.225 |
| Citation | Evgeny E. Glickman, 1996, Defect and Diffusion Forum, 129-130, 225 |
| Authors | Evgeny E. Glickman |
| Keywords | Electromigration, Stress Induced Diffusion, Thin Film |
| Full Paper | 
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