Interstitial Defect Reactions in Silicion: The Case of Copper |
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| Journal | Defect and Diffusion Forum (Volumes 131 - 132) |
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| Volume | Defect and Diffusion Forum Vols. 131-132 |
| Pages | 89-0 |
| DOI | 10.4028/www.scientific.net/DDF.131-132.89 |
| Citation | A. Mesli et al., 1996, Defect and Diffusion Forum, 131-132, 89 |
| Authors | A. Mesli, T. Heiser |
| Keywords | Defect, Diffusion, Electrical Characterisation, Metallic Impurity, Metastability, Pairing |
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