Paper Title:
Interstitial Defect Reactions in Silicion: The Case of Copper
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 131-132)
Pages
89-0
DOI
10.4028/www.scientific.net/DDF.131-132.89
Citation
A. Mesli, T. Heiser, "Interstitial Defect Reactions in Silicion: The Case of Copper", Defect and Diffusion Forum, Vols. 131-132, pp. 89-0, 1996
Online since
March 1996
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Price
$32.00
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