Paper Title:
Band Tailings and Deep Defects in Semiconductors: Application to α-Si:H and α-Ge:H
  Abstract

  Info
Periodical
Edited by
A.A. Teate and N.C. Halder
Pages
86-107
DOI
10.4028/www.scientific.net/DDF.133.86
Citation
A.A. Teate, N.C. Halder, "Band Tailings and Deep Defects in Semiconductors: Application to α-Si:H and α-Ge:H", Defect and Diffusion Forum, Vol. 133, pp. 86-107, 1996
Online since
May 1996
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