Paper Title:
Metastable-Defect Behaviors of Iron-Boron Pairs in Silicon Using Recombination-Enhanced Defect Reaction
  Abstract

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Periodical
Defect and Diffusion Forum (Volumes 136-137)
Edited by
David J. Fisher
Pages
41-60
DOI
10.4028/www.scientific.net/DDF.136-137.41
Citation
H. Nakashima, T. Sadoh, T. Tsurushima, "Metastable-Defect Behaviors of Iron-Boron Pairs in Silicon Using Recombination-Enhanced Defect Reaction", Defect and Diffusion Forum, Vols. 136-137, pp. 41-60, 1996
Online since
March 1996
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Price
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