Paper Title:
Diffusion of Silicon and Phosphorus into Germanium as Studied by Secondary Ion Mass Spectrometry
  Abstract

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Periodical
Defect and Diffusion Forum (Volumes 143-147)
Edited by
H. Mehrer, Chr. Herzig, N.A. Stolwijk, H. Bracht
Pages
1053-1058
DOI
10.4028/www.scientific.net/DDF.143-147.1053
Citation
U. Södervall, M. Friesel, "Diffusion of Silicon and Phosphorus into Germanium as Studied by Secondary Ion Mass Spectrometry", Defect and Diffusion Forum, Vols. 143-147, pp. 1053-1058, 1997
Online since
January 1997
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