Paper Title:
Silicide Islands Formation and Diffusion Processes during Solid-State Reaction of Metallic Glasses Thin Films with Single Crystalline Silicon Substrates
  Abstract

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Periodical
Defect and Diffusion Forum (Volumes 143-147)
Edited by
H. Mehrer, Chr. Herzig, N.A. Stolwijk, H. Bracht
Pages
1297-1302
DOI
10.4028/www.scientific.net/DDF.143-147.1297
Citation
N.V. Rozhanskii, V.O. Lifshits, "Silicide Islands Formation and Diffusion Processes during Solid-State Reaction of Metallic Glasses Thin Films with Single Crystalline Silicon Substrates", Defect and Diffusion Forum, Vols. 143-147, pp. 1297-1302, 1997
Online since
January 1997
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