Defects Below Mask Edges in Silicon Induced by Amorphizing Implantations |
|
| Journal | Defect and Diffusion Forum (Volumes 148 - 149) |
|---|---|
| Volume | Defect and Diffusion Forum Vols. 148-149 |
| Edited by | David J. Fisher |
| Pages | 103-121 |
| DOI | 10.4028/www.scientific.net/DDF.148-149.103 |
| Authors | Hans Cerva |
| Keywords | Arsenic, BF2+, Crystal Defect, Dislocation, Implantation, Mask Edge, Phosphorus, Recrystallization, Secondary Defects, Silicon, Transmission Electron Microscopy (TEM), ULSI, VLSI |
| Full Paper | 
Get the full paper by clicking here
|