Defects Below Mask Edges in Silicon Induced by Amorphizing Implantations |
| Journal |
Defect and Diffusion Forum (Volumes 148 - 149) |
| Volume |
Defect and Diffusion Forum Vols. 148-149 |
| Edited by |
David J. Fisher |
| Pages |
103-121 |
| DOI |
10.4028/www.scientific.net/DDF.148-149.103 |
| Citation |
Hans Cerva, 1997, Defect and Diffusion Forum, 148-149, 103 |
| Authors |
Hans Cerva |
| Keywords |
Arsenic, BF2+, Crystal Defect, Dislocations, Implantation, Mask Edge, Phosphorus, Recrystallization, Secondary Defects, Silicon, TEM, ULSI, VLSI |
| Full Paper |
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