Point Defect Behaviour Resulting from Dopant Diffusions in Silicon |
| Journal |
Defect and Diffusion Forum (Volumes 148 - 149) |
| Volume |
Defect and Diffusion Forum Vols. 148-149 |
| Edited by |
David J. Fisher |
| Pages |
48-102 |
| DOI |
10.4028/www.scientific.net/DDF.148-149.48 |
| Citation |
Takahisa Okino, 1997, Defect and Diffusion Forum, 148-149, 48 |
| Authors |
Takahisa Okino |
| Keywords |
Diffusion, Dopants, Impurity Diffusion, Microdefect, Oxidation Stacking Fault, Point Defect, Self-Diffusion, Semiconductor, Silicon, Swirl Defect, Vacancy Self-Interstitial |
| Full Paper |
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