Boron Diffusion in Pre-Amorphised Silicon: Interactions with the End of Range Defects |
| Journal |
Defect and Diffusion Forum (Volumes 153 - 155) |
| Volume |
Diffusion in Silicon |
| Edited by |
D.J. Fisher |
| Pages |
11-24 |
| DOI |
10.4028/www.scientific.net/DDF.153-155.11 |
| Citation |
D. Mathiot et al., 1997, Defect and Diffusion Forum, 153-155, 11 |
| Authors |
D. Mathiot, A. Claverie, A. Martinez |
| Keywords |
Amorphisation, Anneal, Boron, Defect, Diffusion, Doping, Ion-Implantation, Ostwald Ripening, Self-Interstitial, Silicon |
| Full Paper |
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