Paper Title:
Stress in Silicon Nitride Films and Its Effect on Boron Diffusion in Silicon
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 153-155)
Edited by
D.J. Fisher
Pages
25-44
DOI
10.4028/www.scientific.net/DDF.153-155.25
Citation
S. Matsumoto, K. Osada, Y. Zaitsu, T. Shimizu, E. Arai, S. Tanigawa, F. Uberti, "Stress in Silicon Nitride Films and Its Effect on Boron Diffusion in Silicon", Defect and Diffusion Forum, Vols. 153-155, pp. 25-44, 1998
Online since
November 1997
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