Morphological, Structural and Electronic Damage on InAs and InSb Surfaces Induced by (Reactive) Ion Beam Etching |
| Journal |
Defect and Diffusion Forum (Volumes 183 - 185) |
| Volume |
Defects and Diffusion in Semiconductors |
| Edited by |
D.J. Fisher |
| Pages |
127-146 |
| DOI |
10.4028/www.scientific.net/DDF.183-185.127 |
| Citation |
F. Frost et al., 2000, Defect and Diffusion Forum, 183-185, 127 |
| Authors |
F. Frost, G. Lippold, A. Schindler, F. Bigl |
| Keywords |
Atomic Force Microscope (AFM), Damage, Etching, InAs, InSb, Ion Beam, Raman Spectroscopy, Smoothing |
| Full Paper |
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