Effect of Implant Temperature on Extended Defects Craeted by Ion Implantation in Silicon |
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| Journal | Defect and Diffusion Forum (Volumes 183 - 185) |
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| Volume | Defects and Diffusion in Semiconductors |
| Edited by | D.J. Fisher |
| Pages | 163-170 |
| DOI | 10.4028/www.scientific.net/DDF.183-185.163 |
| Authors | J. Wong-Leung, S. Fatima, C. Jagadish, J.D. FitzGerald |
| Keywords | Critical Dose, Interstitial Defects, Ion Implantation, Loop, Rod-Like Defects, Silicon |
| Full Paper | 
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