Paper Title:
Effect of Implant Temperature on Extended Defects Craeted by Ion Implantation in Silicon
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 183-185)
Edited by
D.J. Fisher
Pages
163-170
DOI
10.4028/www.scientific.net/DDF.183-185.163
Citation
J. Wong-Leung, S. Fatima, C. Jagadish, J.D. FitzGerald, "Effect of Implant Temperature on Extended Defects Craeted by Ion Implantation in Silicon", Defect and Diffusion Forum, Vols. 183-185, pp. 163-170, 2000
Online since
August 2000
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Price
$32.00
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