Damage in III-V Semiconductors from very Low-Energy Process Plasmas |
| Journal |
Defect and Diffusion Forum (Volumes 183 - 185) |
| Volume |
Defects and Diffusion in Semiconductors |
| Edited by |
D.J. Fisher |
| Pages |
61-76 |
| DOI |
10.4028/www.scientific.net/DDF.183-185.61 |
| Citation |
Mahfuzur Rahman, 2000, Defect and Diffusion Forum, 183-185, 61 |
| Authors |
Mahfuzur Rahman |
| Keywords |
Channeling, Diffusion, Dry-Etch Damage, Etching, GaAs, InGaAs, Ion-Implantation, Photoluminescence (PL), Quantum Well, Radiation-Enhanced Diffusion, Reactive Ion Etching |
| Full Paper |
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