Paper Title:
Damage in III-V Semiconductors from very Low-Energy Process Plasmas
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 183-185)
Edited by
D.J. Fisher
Pages
61-76
DOI
10.4028/www.scientific.net/DDF.183-185.61
Citation
M. Rahman, "Damage in III-V Semiconductors from very Low-Energy Process Plasmas", Defect and Diffusion Forum, Vols. 183-185, pp. 61-76, 2000
Online since
August 2000
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Price
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