Damage in III-V Semiconductors from very Low-Energy Process Plasmas |
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| Journal | Defect and Diffusion Forum (Volumes 183 - 185) |
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| Volume | Defects and Diffusion in Semiconductors |
| Edited by | D.J. Fisher |
| Pages | 61-76 |
| DOI | 10.4028/www.scientific.net/DDF.183-185.61 |
| Authors | Mahfuzur Rahman |
| Keywords | Channeling, Diffusion, Dry-Etch Damage, Etching, GaAs, InGaAs, Ion Implantation, Photoluminescence, Quantum Well, Radiation-Enhanced Diffusion, Reactive Ion Etching |
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