Paper Title:
Reaction Diffusion in the Au-Ti System between 1110K and 1150K
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 194-199)
Edited by
Y. Limoge and J.L. Bocquet
Pages
1569-1574
DOI
10.4028/www.scientific.net/DDF.194-199.1569
Citation
O. Taguchi, T. Watanobe, Y. Yamazaki, Y. Iijima, "Reaction Diffusion in the Au-Ti System between 1110K and 1150K", Defect and Diffusion Forum, Vols. 194-199, pp. 1569-1574, 2001
Online since
April 2001
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.