Paper Title:
Layer-Growth of Tantalum Nitrides by Nitridation of Ta Metal: the Basis of the Preparation of a Well-Characterised Nitrogen Standard Material
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 194-199)
Edited by
Y. Limoge and J.L. Bocquet
Pages
1613-1618
DOI
10.4028/www.scientific.net/DDF.194-199.1613
Citation
M. Dopita, B. Wollein, D. Rafaja, W. Gruner, W. Lengauer, "Layer-Growth of Tantalum Nitrides by Nitridation of Ta Metal: the Basis of the Preparation of a Well-Characterised Nitrogen Standard Material", Defect and Diffusion Forum, Vols. 194-199, pp. 1613-1618, 2001
Online since
April 2001
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Price
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