Paper Title:
Oxygen Self Diffusion in SiO2: An Ab-Initio Approach
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 194-199)
Edited by
Y. Limoge and J.L. Bocquet
Pages
287-294
DOI
10.4028/www.scientific.net/DDF.194-199.287
Citation
G. Roma, Y. Limoge, S. Baroni, "Oxygen Self Diffusion in SiO2: An Ab-Initio Approach", Defect and Diffusion Forum, Vols. 194-199, pp. 287-294, 2001
Online since
April 2001
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.