Paper Title:
Diffusion in the Intermetallic Phase of Ordered FexSi1-x (0.69 < x < 0.78)
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 194-199)
Edited by
Y. Limoge and J.L. Bocquet
Pages
363-368
DOI
10.4028/www.scientific.net/DDF.194-199.363
Citation
H. Thiess, B. Sepiol, R. Rüffer, G. Vogl, "Diffusion in the Intermetallic Phase of Ordered FexSi1-x (0.69 < x < 0.78)", Defect and Diffusion Forum, Vols. 194-199, pp. 363-368, 2001
Online since
April 2001
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Price
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