Paper Title:
Diffusion of Si and Ge in the Intermetallic Phase Fe3Si: Ion Implantation and SIMS Studies
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 194-199)
Edited by
Y. Limoge and J.L. Bocquet
Pages
499-504
DOI
10.4028/www.scientific.net/DDF.194-199.499
Citation
M. Wellen, P. Fielitz, G. Borchardt, S. Weber, S. Scherrer, H. Mehrer, H. Baumann, B. Sepiol, "Diffusion of Si and Ge in the Intermetallic Phase Fe3Si: Ion Implantation and SIMS Studies", Defect and Diffusion Forum, Vols. 194-199, pp. 499-504, 2001
Online since
April 2001
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Price
$32.00
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