Vacancy Model for Threshold Electromigration in Thin Metallic Films |
| Journal |
Defect and Diffusion Forum (Volumes 194 - 199) |
| Volume |
Diffusion in Materials DIMAT2000 |
| Edited by |
Y. Limoge and J.L. Bocquet |
| Pages |
55-60 |
| DOI |
10.4028/www.scientific.net/DDF.194-199.55 |
| Citation |
A.N. Aleshin et al., 2001, Defect and Diffusion Forum, 194-199, 55 |
| Authors |
A.N. Aleshin, Lasar S. Shvindlerman |
| Keywords |
Diffusion, Drift Velocity, Electron Wind, Flux, Grain Boundary, Sink, Source, Thin Film, Threshold Electromigration, Vacancy |
| Full Paper |
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