Paper Title:
Vacancy Model for Threshold Electromigration in Thin Metallic Films
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 194-199)
Edited by
Y. Limoge and J.L. Bocquet
Pages
55-60
DOI
10.4028/www.scientific.net/DDF.194-199.55
Citation
A.N. Aleshin, L. S. Shvindlerman, "Vacancy Model for Threshold Electromigration in Thin Metallic Films", Defect and Diffusion Forum, Vols. 194-199, pp. 55-60, 2001
Online since
April 2001
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Price
$32.00
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