A Perspective from Crystal Growth and Wafer Processing on the Properties of Intrinsic Point Defects in Silicon |
| Journal |
Defect and Diffusion Forum (Volumes 200 - 202) |
| Volume |
Defects and Diffusion in Semiconductors IV |
| Edited by |
D.J. Fisher |
| Pages |
125-134 |
| DOI |
10.4028/www.scientific.net/DDF.200-202.125 |
| Citation |
Robert J. Falster et al., 2001, Defect and Diffusion Forum, 200-202, 125 |
| Authors |
Robert J. Falster, Vladimir V. Voronkov |
| Keywords |
Defect Reactions, Denuded Zones, Interstitial Growth, Perfect Silicon, Rapid Thermal Processing, Vacancy Profiles |
| Full Paper |
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