Limits of Ion-Beam Depth-Profiling as Used in Diffusion Studies of Oxidation-Sensitive Materials |
| Journal |
Defect and Diffusion Forum (Volumes 203 - 205) |
| Volume |
Defects and Diffusion in Metals
|
| Edited by |
D.J. Fisher |
| Pages |
147-152 |
| DOI |
10.4028/www.scientific.net/DDF.203-205.147 |
| Citation |
H. Ehmler et al., 2002, Defect and Diffusion Forum, 203-205, 147 |
| Authors |
H. Ehmler, A. Rehmet, Klaus Rätzke, Franz Faupel |
| Keywords |
Depth-Profiling, Isotope Effect, Oxidation, Preferential Sputtering |
| Full Paper |
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|
