Paper Title:
Limits of Ion-Beam Depth-Profiling as Used in Diffusion Studies of Oxidation-Sensitive Materials
  Abstract

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Periodical
Defect and Diffusion Forum (Volumes 203-205)
Edited by
D.J. Fisher
Pages
147-152
DOI
10.4028/www.scientific.net/DDF.203-205.147
Citation
H. Ehmler, A. Rehmet, K. Rätzke, F. Faupel, "Limits of Ion-Beam Depth-Profiling as Used in Diffusion Studies of Oxidation-Sensitive Materials", Defect and Diffusion Forum, Vols. 203-205, pp. 147-152, 2002
Online since
February 2002
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