Paper Title:
Modelling Investigation of Boron Diffusion in Polycrystalline HfO2 Films
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 206-207)
Edited by
D.J. Fisher
Pages
123-130
DOI
10.4028/www.scientific.net/DDF.206-207.123
Citation
C. L. Liu, "Modelling Investigation of Boron Diffusion in Polycrystalline HfO2 Films", Defect and Diffusion Forum, Vols. 206-207, pp. 123-130, 2002
Online since
July 2002
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Price
$32.00
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