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Modelling Investigation of Boron Diffusion in Polycrystalline HfO2 Films

Journal Defect and Diffusion Forum (Volumes 206 - 207)
Volume Defects and Diffusion in Ceramics
Edited by D.J. Fisher
Pages 123-130
DOI 10.4028/www.scientific.net/DDF.206-207.123
Citation Chun Li Liu, 2002, Defect and Diffusion Forum, 206-207, 123
Authors Chun Li Liu
Keywords Ab Initio Modeling, B Diffusion, Polycrystalline Oxide, Thin Film
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