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On the Role of Bulk Recombination of Intrinsic Point Defects in Si and their Interaction with the Surface in the Course of {113} Defect Growth: a Kinetic Study by in situ HVEM Irradiation

Journal Defect and Diffusion Forum (Volumes 210 - 212)
Volume Defects and Diffusion in Semiconductors
Edited by D.J. Fisher
Pages 21-36
DOI 10.4028/www.scientific.net/DDF.210-212.21
Authors Liudmila I. Fedina
Keywords {113} Defects, Intrinsic Point Defects (IPD), Recombination, Silicon, Surface Interaction
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