Paper Title:
Cavity Formation in Helium-Implanted Silicon - Temperature Dependence
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 210-212)
Edited by
D.J. Fisher
Pages
37-42
DOI
10.4028/www.scientific.net/DDF.210-212.37
Citation
J. F. Barbot, E. Oliviero, M.-L. David, S. Rousselet, M. F. Beaufort, A. van Veen, "Cavity Formation in Helium-Implanted Silicon - Temperature Dependence", Defect and Diffusion Forum, Vols. 210-212, pp. 37-42, 2002
Online since
November 2002
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Price
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