Teh Effect of Boron Concentration upon Defect Formation after Laser Thermal Processing using Molecular Dynamics |
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| Journal | Defect and Diffusion Forum (Volumes 210 - 212) |
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| Volume | Defects and Diffusion in Semiconductors |
| Edited by | D.J. Fisher |
| Pages | 71-80 |
| DOI | 10.4028/www.scientific.net/DDF.210-212.71 |
| Citation | L. Wang et al., 2002, Defect and Diffusion Forum, 210-212, 71 |
| Authors | L. Wang, C.S. Murthy, P. Clancy |
| Keywords | Boron Concentration, Defect Formation, Laser Thermal Processing, Molecular Dynamics (MD) |
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