Paper Title:
Teh Effect of Boron Concentration upon Defect Formation after Laser Thermal Processing using Molecular Dynamics
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 210-212)
Edited by
D.J. Fisher
Pages
71-80
DOI
10.4028/www.scientific.net/DDF.210-212.71
Citation
L. Wang, C.S. Murthy, P. Clancy, "Teh Effect of Boron Concentration upon Defect Formation after Laser Thermal Processing using Molecular Dynamics", Defect and Diffusion Forum, Vols. 210-212, pp. 71-80, 2002
Online since
November 2002
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Price
$32.00
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