Paper Title:
Diffusion of Ga Implanted into α-Ti Studied by Means of the Rutherford Backscattering Technique
  Abstract

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Periodical
Defect and Diffusion Forum (Volumes 213-215)
Edited by
D.J. Fisher
Pages
1-18
DOI
10.4028/www.scientific.net/DDF.213-215.1
Citation
M. Behar, J.H.R. dos Santos, F. Bernardi, F. Dyment, "Diffusion of Ga Implanted into α-Ti Studied by Means of the Rutherford Backscattering Technique ", Defect and Diffusion Forum, Vols. 213-215, pp. 1-18, 2003
Online since
March 2003
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