Paper Title:
Recent Advances in the Measurement of Interstitial Oxygen in Silicon by Infra-Red Spectroscopy
  Abstract

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Periodical
Defect and Diffusion Forum (Volumes 221-223)
Edited by
D.J. Fisher
Pages
123-132
DOI
10.4028/www.scientific.net/DDF.221-223.123
Citation
B. Pivac, A. Sassella, A. Borghesi, "Recent Advances in the Measurement of Interstitial Oxygen in Silicon by Infra-Red Spectroscopy ", Defect and Diffusion Forum, Vols. 221-223, pp. 123-132, 2003
Online since
November 2003
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