Modeling of Dopant and Defect Interactions in Si Process Simulators |
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| Journal | Defect and Diffusion Forum (Volumes 221 - 223) |
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| Volume | Defects and Diffusion in Semiconductors |
| Edited by | D.J. Fisher |
| Pages | 31-40 |
| DOI | 10.4028/www.scientific.net/DDF.221-223.31 |
| Citation | Lourdes Pelaz et al., 2003, Defect and Diffusion Forum, 221-223, 31 |
| Authors | Lourdes Pelaz, Luis Alberto Marqués, María Aboy, Juan Barbolla |
| Keywords | Defect, Dopants, Ion-Implantation, Modeling |
| Full Paper | 
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