Paper Title:
Modeling of Dopant and Defect Interactions in Si Process Simulators
  Abstract

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Periodical
Defect and Diffusion Forum (Volumes 221-223)
Edited by
D.J. Fisher
Pages
31-40
DOI
10.4028/www.scientific.net/DDF.221-223.31
Citation
L. Pelaz, L. A. Marqués, M. Aboy , J. Barbolla, "Modeling of Dopant and Defect Interactions in Si Process Simulators ", Defect and Diffusion Forum, Vols. 221-223, pp. 31-40, 2003
Online since
November 2003
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