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Modelling of Staebler-Wronski Effect in Hydrogenated Amorphous Silicon under Moderate and Intense Illumination

Journal Defect and Diffusion Forum (Volumes 230 - 232)
Volume Defects and Diffusion in Semiconductors - An Annual Retrospective VII
Edited by David J. Fisher
Pages 221-232
DOI 10.4028/www.scientific.net/DDF.230-232.221
Citation A.F. Meftah et al., 2004, Defect and Diffusion Forum, 230-232, 221
Authors A.F. Meftah, A.M. Meftah, A. Merazga
Keywords a-Si:H, Bimolecular Recombination, Monomolecular Recombination, Staebler-Wronski Effect
Abstract

A new model is developed for the Staebler-Wronski effect (SWE) in intrinsic a-Si:H. In this model, non-radiative recombination of the photogenerated carriers occurs at a weak bond close to a SiHHSi configuration, which allows a local creation of defect of the SiHD type. This defect can be annihilated by mobile hydrogen atom that has been emitted from an other distant SiHD defect as a result of non-radiative recombination at this defect site. In this study we have considered illumination intensities in the moderate and intense illumination range. In both cases, the proposed model reproduces many experimental features of the SWE known in the literature.

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