Paper Title:
Which is Larger, a Self-Interstitial or a Vacancy Activation Energy of Diffusion in Silicon?
  Abstract

  Info
Periodical
Defect and Diffusion Forum (Volumes 237-240)
Edited by
M. Danielewski, R. Filipek, R. Kozubski, W. Kucza, P. Zieba, Z. Zurek
Pages
181-188
DOI
10.4028/www.scientific.net/DDF.237-240.181
Citation
T. Okino, T. Shimozaki, C.G. Lee, "Which is Larger, a Self-Interstitial or a Vacancy Activation Energy of Diffusion in Silicon?", Defect and Diffusion Forum, Vols. 237-240, pp. 181-188, 2005
Online since
April 2005
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